BAK EVAPORATORS
Platforms from 0.5 to 2.0 meters
BAK EVAPORATORS
With new levels of flexibility, and new levels of process control the BAK Evaporator is the industry leader in selected applications across Power Device, Wireless, LED, MEMS and Photonics applications. There is a BAK thats suitable for everyone - from the compact BAK 501 for universities and research institutions to the BAV 2000, a production giant.
Find out about the range ofdifferent configurations by clicking on the tabs to the right or contact us for immediate help
GET STARTED - FIND THE RIGHT BAK FOR YOU
Step 1: Check what system capacity you need
Start by selecting a basic platform size according to your substrate size and preferred batch capacity for standard calotte handling. Click here to view a capacity chart for different system sizes.
Step 2: Choose your sources, accessories and process control technologies
To take a quick look at our portfolio of sources and process accessories click here - from effusion cells and digital beam sweep electron beam guns, to chamber heating and plasma sources for PIAD.
To read more about Evatec advanced process control technologies including quartz and optical monitoring click here
Step 3: Customize your BAK according to your processes and fab integration requirements
Investigate further custom options to build a BAK that’s just right for you.
- "Lift Off" platforms with extended throw for zero side wall coverage
- "Split Chamber" platforms for sensitive source materials and reduced batch cycle times
- Automated Handling options including single wafer transfer, assisted calotte load or full robot load or the calotte and transfer to the coating chamber from fontend cassettes
Step 4: Benefit from Evatec's Unicalc Solutions
Whatever configuration you choose, all our BAK family members come with 50 years of process know-how. Evatec Unicalc solutions for shaper optimization at the smallest dimensions are a perfect way to increase deposition rates for higher throughput and reduce material usage for critical processes using precious metals. To find out more about Unicalc click here.
Step 5: Download the BAK Family brochure
To get the complete overview about the BAK Family download the brochure or visit the news section of our website.
Got a BAK already ?
Do you want to extend the life of your existing BAK with new process capabilities or the latest modern control systems? Click here to download our retrofit brochure.
CHOOSE A CONFIGURATION
Standard Throw
Evatec has delivered in excess of 2000 BAK evaporators to the market, the majority of which are "standard throw", configured for conventional high precision coating processes on 2D and 2.5D substrates.
From the compact 0.5 metre BAK 501, optimized for university R&D to the giant BAV2000 handling 65 8inch substrates in a single batch our systems can all be equipped with Evatec's own source and process control technologies to ensure high precision processes across in semiconductor, optoelectronics and photonics.
Choosing an Evatec evaporator means you can be confident
- you have access to the widest range of source technologies including thermal sources, effusion cells and e-guns
- you have access to Evatec's quartz and optical monitoring know-how
- our engineers are ready to support you with custom tooling options according to your application
- you can explore options for split chamber or assisted loading options if required
To read more about the BAK Family click the Download icon in the picture or visit the news section of our web site.
Lift Off / Extended Throw
Evatec 'lift off' systems have extended throw for process geometries where subsequent film patterning steps call for zero side wall coverage.
Extended throw system benefits
- Best control of 'lift off' processes
- Retention of full chamber flexibility for any future process requirements
Evatec 'lift off' systems use all the proven source and process control components of our standard throw platforms such as our EBS E gun technology and our Khan system and process controller but have lowered source chambers according to calotte geometry and substrate size to achieve the correct working distances required during evaporation. They are available in a wide range of platform sizes.
Just like standard throw systems however, "Lift Off" systems can also be specified in Split Chamber format or to incorporate one of a number of Assisted Loading options.
Looking for even more flexibility?
Ask about Evatec’s custom engineering solutions with interchangeable or motor driven tooling enabling both standard and "lift off" processes to be run easily in the same chamber as well as chamber extensions to run "in-situ" high uniformity etch prior to dep.
To read more about the BAK Family download the brochure or visit the news section of our web site.
Split Chamber
Evatec "Split Chamber" systems integrate a valve between source and substrate chamber, allowing the sources to be kept 'ready' under vacuum during main chamber vent and substrate load/unload.
Split chamber benefits in a n nutshell
- Ultra-stable source performance
- Shortened batch times for enhanced throughputs
- Ideal for doping processes, handling of reactive or sensitive coating materials
- "Pull out" configuration for source makes for rapid source maintenance / replenishment.
"Split Chamber" systems are already a well proven Evatec part of the BAK family. They use proven EBS E Gun technology and our Khan system and process controller. Taking the best from our 'Samson' platform, our new generation systems make life even easier with slide out source chambers for rapid refill and maintenance, a wider range of source technologies like extended capacity e guns or effusion cells, and the most accurate quartz and GSM optical monitoring control techniques ever with 'on line re-optimization' mid process for the most demanding thin film stack designs.
To read more about the BAK Family download the brochure or visit the news section of our web site.
SOURCES & TOOLING
Sources & Thickness Control
Your BAK is prepared for installation of a whole range of deposition and etch sources including accessories like front and backside heating systems.
The chamber base plate and side walls come with a series of standard feedthroughs enabling installation of the combinations of deposition and etch sources required for layer processing.
All our sources are engineered for 24/7 production, robust and easy to maintain, optimized for the lowest materials utilization and the best repeatability.
As process requirements change in the future, simply reconfigure your system by moving, exchanging or adding new ones, reconfigure your “Khan” control system in just a few minutes and you are ready to go. Control rates and terminate your layers with Evatec’s QCM quartz monitoring technology at 5 or 6MHz featuring high sampling rates, high speed switch between crystals and simultaneous control of up to 4 quartz heads from a single controller. For real time direct measurement of optical layer performance during deposition choose monochromatic or broadband optical monitoring techniques for UV, VIS and IR.
Tooling
Evatec’s portfolio of tooling solutions is designed to maximize batch capacity for evaporation processes without compromise on film quality. Choose from single piece and segmented domes with standard geometries or flip systems for double sided processes.
For high rate metallization our range of planetary system designs enables larger batch sizes and lowest materials utilization and for complex substrate geometries our engineering department offers a bespoke design service.
Where wall or door mounted large area rectangular sputter sources are specified, we offer proven rotary cage tooling designs for easy load / unload of carriers and maximum coating area per batch.