With new levels of flexibility, and new levels of process control the BAK Evaporator is the industry leader in selected applications across Power Device, Wireless, MEMS, Optoelectronics and Photonics applications. There is a BAK thats suitable for everyone - from the compact BAK 501, perfect for universities and research institutions to the BAK 1401, a production giant capable of handling the largest substrate sizes in the biggest batch sizes.
With Evatec's latest handling know how there are more possibilities than ever. Choose from manual substrate loading of a single BAK tool, all the way to fully automated cassette-to-cassette processing with multiple BAK tools configured around a central atmospheric handler.
Contact us for immediate help to specify a BAK thats perfect for your process requirements, substrate size and throughput.
Click on the individual sections in the circle for a quick overview, and then find more information further down the page.
With a whole range of sizes from the BAK 501 to the BAK 1401 there is bound to be a size that fits for you process, substrate size and throughout requirements.
BAK tools can be configured with different handling options according to process requirement, substrate size and throughput:
Evatec know-how in process control ensures precise layer termination for deposition of metals, TCOs, dielectrics and piezoelectric materials
Choose from:
With over 50 years of know-how in tooling design, our engineers are used to solving tooling challenges to ensure coatings achieve specification over the substrate area you want.
Know-how in rotating and planetary drives is supplemented by custom solutions everything from drives with controllable angle of incidence to drives changing source substrate distance in-situ.
Evatec BAK platforms are designed to reduce use of resources in their daily use:
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Get started with the BAK - from sizes to sources, a quick introduction to the BAK family.
Get an overview of the different geometry types optimized for different processes.
Benefit from Evatec's 50 years production know-how in Tooling, Source and Process Control Solutions.
Opening up new fully automated possibilities - clustering multiple BAKs around a central handler for high volume applications across wireless, power and optoelectronics.
If you working with traditional manual loading of substrates start by selecting a basic platform size according to your preferred substrate size and fab batch processing capacity.
Take a quick look at our portfolio of sources and process accessories on the right - from effusion cells and digital beam sweep electron beam guns, to chamber heating and plasma sources for PIAD. Evatec advanced process control technologies including quartz and optical monitoring mean that levels of precision and repeatability in thin film deposition are better than ever.
Read more in the GSM brochure.
But don't worry if you are not sure what combination of technologies are best for you. Our specialist are here to help.
Evatec can configure and build a BAK with process geometries, substrate tooling and handling options that fit for you. Here are some typical examples of how we can help
Whatever configuration you choose, all our BAK family members come with 50 years of process know-how. Evatec Unicalc solutions for shaper optimization at the smallest dimensions are a perfect way to increase deposition rates for higher throughput and reduce material usage for critical processes using precious metals.
Extend the life of your existing BAK with new process capabilities or the latest modern control systems.
Get the complete overview about the BAK Family.
Evatec has delivered in excess of 2000 BAK evaporators to the market, the majority of which are "standard throw", configured for conventional high precision coating processes on 2D and 2.5D substrates.
From the compact 0.5 meter BAK 501, optimized for university R&D to the giant BAK 1401 handling 28 pieces of 8 inch substrates in a single batch our systems can all be equipped with Evatec's own source and process control technologies to ensure high precision processes across in semiconductor, optoelectronics and photonics.
Choosing an Evatec evaporator means you can be confident
Evatec 'lift off' systems have extended throw for process geometries where subsequent film patterning steps call for zero side wall coverage.
Evatec 'lift off' systems use all the proven source and process control components of our standard throw platforms such as our EBS E gun technology and our Khan system and process controller but have lowered source chambers according to calotte geometry and substrate size to achieve the correct working distances required during evaporation. They are available in a wide range of platform sizes.
Just like standard throw systems however, "Lift Off" systems can also be specified in Split Chamber format for handling sensitive coating materials or for driving up substrate throughput by lowering cycle times.
Ask about Evatec’s custom engineering solutions with interchangeable or motor driven tooling enabling both standard and "lift off" processes to be run easily in the same chamber as well as chamber configurations to run "in-situ" high uniformity etch prior to dep.
Evatec "Split Chamber" systems integrate a valve between source and substrate chamber, allowing the sources to be kept 'ready' under vacuum during main chamber vent and substrate load/unload.
"Split Chamber" systems are already a well proven part of the Evatec BAK family. They use proven EBS E Gun technology and our Khan system and process controller. Taking the best from our well know 'Samson' platforms delivered previously, our new generation systems make life even easier with slide out source chambers for rapid refill and maintenance, a wider range of source technologies like extended capacity e guns or effusion cells, and the most accurate quartz and GSM optical monitoring control techniques ever with 'on line re-optimization' mid process for the most demanding thin film stack designs.
Your BAK is ready for installation of a whole range of deposition and etch sources, but also a whole range or accessories essential for precision processes. From front and backside heating to "insitu" process monitoring technologies which adapt and tune processes "on the fly" Evatec solutions support repeatability and process yield.
BAK chamber base plate and side walls come with a series of standard feedthroughs enabling installation of the combinations of deposition, etch, and process accessories required for layer processing.
All our sources are engineered for 24/7 production, robust and easy to maintain, optimized for the lowest materials utilization and the best repeatability. You can read more about our range of sources in the BAK family brochure.
As process requirements change in the future, simply reconfigure your system by moving, exchanging or adding new ones, reconfigure your “Khan” control system in just a few minutes and you are ready to go. Control rates and terminate your layers with Evatec’s QCM quartz monitoring technology at 5 or 6MHz featuring high sampling rates, high speed switch between crystals and simultaneous control of up to 4 quartz heads from a single controller. For real time direct measurement of optical layer performance during deposition choose monochromatic or direct broadband optical monitoring techniques with direct monitoring between 380 and 1700nm for UV, VIS and IR processes.
Evatec’s portfolio of tooling solutions is designed to maximize batch capacity for evaporation processes without compromise on film quality. Choose from single piece and segmented domes with standard geometries or flip systems for double sided processes.
For high rate metallization our range of planetary system designs enables larger batch sizes and lowest materials utilization and for complex substrate geometries our engineering department offers a bespoke design service.
Evatec launched its ground breaking Multi BAK concept 4 years ago. Taking our know how in automated handling and load lock technology, then combining multiple BAK process chamber in a clustered configuration around an atmospheric robot handler, the Multi BAK concept brings even greater levels of process repeatability and a jump in in the highest volume applications.
... and now its available in two configurations, the "Multi BAK" or "BAK911", both designed to maximize throughput and process repeatability for 6 and 8 inch wafers.
Why not watch the video then contact your local Evatec sales and service office to find out more.
Through its concept, hardware and pumping design the Multi BAK is also leading the way in driving down energy consumption in its use. Talk to our specialists to learn how the MULTI BAK can reduce your energy consumption by top to 60% compared with conventional stand alone platforms.
Learn how Evatec evaporation solutions on the BAK and the latest substrate handling options are helping customers deliver the process repeatabilities and high production yields essential for successful manufacture of III-V solar cells.