BAK Evaporators

Platforms from 0.5 to 1.4 meters with 50 years of process know-how

 

The BAK – Pushing boundaries in evaporation technology

Evatec Web Icons BAK 01

Power Devices

  • Backside Metallization with best materials utilization
  • Precision and repeatability in “lift off”
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Wireless

  • Advanced solutions - IDT electrodes for TF-SAW   
  • Automated handling solutions for best CoO
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Precision Optics

  • From UV to IR - Delivering new levels of process control
  • BB and hybrid Optical monitoring direct up to ????nm
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MEMS

  • Outstanding platform flexibility for deposition of metals, dielectrics, TCOs
  • Co-evaporation processes - from quantum computing to digital scintillators

There's a BAK thats perfect for you  

With new levels of flexibility, and new levels of process control the BAK Evaporator is the industry leader in selected applications across Power Device, Wireless, MEMS, Optoelectronics  and Photonics applications. There is a BAK thats suitable for everyone - from the compact BAK 501, perfect  for universities and research institutions to the BAK 1401, a production giant capable of handling the largest substrate sizes in the biggest batch sizes.

With Evatec's latest handling know how there are  more possibilities than ever. Choose from manual substrate loading of a single BAK tool, all the way to fully automated cassette-to-cassette processing with multiple BAK tools configured around a central atmospheric handler. 

Want immediate help?

 Contact us for immediate help to specify a BAK thats perfect for your process requirements, substrate size and throughput.

Major system components - A quick guide

Click on the individual sections in the circle for a quick overview, and then find more information further down the page.

BAK sizes

With a whole range of sizes from the BAK 501 to the BAK 1401 there is bound to be a size that fits for you process, substrate size and throughout requirements.

Substrate handling

BAK tools can be configured with different handling options according to process requirement, substrate size and throughput:

  • Manual front side "substrate" or "segment" loading 
  • Atmospheric loading assist for segments using "Lazy Susan"
  • Fully automated vacuum load lock transfer from front end cassette / SMIF ports as part of  Evatec's "Multi BAK" platform

Sources and Tooling

  • Deposition: From boats to barrel sources and e guns, Evatec design and builds its own sources to give the you the best in materials utilisation and reliability.
  • Etch: Round and moveable linear sources deliver high rate, accurate in-situ deposition and etch processes.
  • IAD: Improved film qualities, lower process temperature, and shorter process times.

Process Control

Evatec know-how in process control ensures precise layer termination for deposition of metals, TCOs, dielectrics and piezoelectric materials

Choose from: 

  • Evatec quartz crystal monitoring systems in single or multi head configurations for complex processes such as co-evaporation
  • Direct monochromatic or broadband optical monitoring from 380 to 1700nm for optical stacks in the UV, VIS or IR

Tooling

With over 50 years of know-how in tooling design, our engineers are used to solving tooling challenges to ensure coatings achieve specification over the substrate area you want.

Know-how in rotating  and planetary drives is supplemented by custom solutions everything from drives with controllable angle of incidence to drives changing source substrate distance in-situ.

Sustainability

Evatec BAK platforms are designed to reduce use of resources in their daily use:

  • Know-how such as "Unicalc" for uniformity shield design ensures the most effective use of consumables during evaporation processes.
  • Vacuum system design in our "split chamber" and "Multi BAK" systems reduces pumping volumes and energy consumption.

Platform configurations

Choose from

  • Standard chamber geometries with manual or automated loading
  • Split chamber configurations maintaining sources under vacuum 
  • Extended throw configurations for "lift off" processes
  • Custom configurations leveraging Evatec know-how 

RGA & BPG

  • BPG: Additional pressure gauge for the use of process gases.
  • Residual Gas analyzer is used to analyze atomic and molecular masses inside the vacuum chamber.
BAK General

Get Started

Get started with the BAK - from sizes to sources, a quick introduction to the BAK family.

BAK inside

More about BAK Geometries

Get an overview of the different geometry types optimized for different processes.

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Sources & Tooling Know-how

Benefit from Evatec's 50 years production know-how in Tooling, Source and Process Control Solutions.

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The Multi BAK - take a leap forward

Opening up new fully automated possibilities - clustering multiple BAKs around a central handler for high volume applications across wireless, power and optoelectronics.

Get started with configuring a BAK - A quick guide 

Step 1

Consider your typical substate and batch sizes 

If you working with traditional manual loading of substrates start by selecting a basic platform size according to your preferred substrate size and fab batch processing capacity. 

Step 2

Already know what kinds of sources and process accessories you need?

Take a quick look at our portfolio of sources and process accessories on the right - from effusion cells and digital beam sweep electron beam guns, to chamber heating and plasma sources for PIAD. Evatec advanced process control technologies including quartz and optical monitoring mean that levels of precision and repeatability in thin film deposition are better than ever. 

Read more in the GSM brochure.

Do you need help?

But don't worry if you are not sure what combination of technologies are best for you. Our specialist are here to help. 

Contact us now.

Step 3

Configure your BAK according to your processes and fab integration requirements

Evatec can configure and build a BAK with process geometries, substrate tooling and handling options that fit for you. Here are some typical examples of how we can help

  • "Lift Off" platforms with extended throw for processes requiring zero side wall coverage
  • "Split Chamber" platforms. These are ideal for processing of sensitive source materials which must be kept under vacuum. Reduced pumping requirements also bring further benefits of reduced batch cycle times
  • Automation options such as robot calotte load (Lazy Susan) of a single BAK or Evatec's innovative "Multi BAK" with atmospheric front end robot servicing multiple BAKs from cassette or SMIF open up new possibilities for driving up throughput and yield  in volume manufacturing
  • Custom motor driven tooling options managing coating geometries - from variable angle to active source / substrate separation

Step 4

Benefit from Evatec's Unicalc Solutions

Whatever configuration you choose, all our BAK family members come with 50 years of process know-how. Evatec Unicalc solutions for shaper optimization at the smallest dimensions are a perfect way to increase deposition rates for higher throughput and reduce material usage for critical processes using precious metals. 

Got a BAK already?

Extend the life of your existing BAK with new process capabilities or the latest modern control systems.

Want to learn more?

Get the complete overview about the BAK Family.

More about BAK Geometries 

Standard Throw

Evatec has delivered in excess of 2000 BAK evaporators to the market, the majority of which are "standard throw", configured for conventional high precision coating processes on 2D and 2.5D substrates.

From the compact 0.5 meter BAK 501, optimized for university R&D to the giant BAK 1401 handling 28 pieces of 8 inch substrates in a single batch our systems can all be equipped with Evatec's own source and process control technologies to ensure high precision processes across in semiconductor, optoelectronics and photonics.

Choosing an Evatec evaporator means you can be confident 

  • you have access to the widest range of source technologies including thermal sources, effusion cells and e-guns
  • you have access to Evatec's in situ quartz and optical monitoring know-how for precise layer termination 
  • you can gain access to our engineers experience engineering custom tooling options fit for production
  • you can retrofit or upgrade your BAK in years to come as your process requirements change 

Lift Off / Extended Throw

Evatec 'lift off' systems have extended throw for process geometries where subsequent film patterning steps call for zero side wall coverage.

Extended throw system benefits
  • Best control of 'lift off' processes
  • Retention of full chamber flexibility for any future process requirements

Evatec 'lift off' systems use all the proven source and process control components of our standard throw platforms such as our EBS E gun technology and our Khan system and process controller but have lowered source chambers according to calotte geometry and substrate size to achieve the correct working distances required during evaporation. They are available in a wide range of platform sizes.

Just like standard throw systems however, "Lift Off" systems can also be specified in Split Chamber format for handling sensitive coating materials or for driving up substrate throughput by lowering cycle times.

Looking for even more flexibility?

Ask about Evatec’s custom engineering solutions with interchangeable or motor driven tooling enabling both standard and "lift off" processes to be run easily in the same chamber as well as chamber configurations to run "in-situ" high uniformity etch prior to dep.

Split Chamber

Evatec "Split Chamber" systems integrate a valve between source and substrate chamber, allowing the sources to be kept 'ready' under vacuum during main chamber vent and substrate load/unload.

Split chamber benefits in a nutshell
  • Ultra-stable source performance
  • Shortened batch times for enhanced throughputs
  • Ideal for doping processes, handling of reactive or sensitive coating materials
  • "Pull out" configuration for source makes for rapid source maintenance / replenishment.

"Split Chamber" systems are already a well proven part of the Evatec BAK family. They use proven EBS E Gun technology and our Khan system and process controller. Taking the best from our well know 'Samson' platforms delivered previously, our new generation systems make life even easier with slide out source chambers for rapid refill and maintenance, a wider range of source technologies like extended capacity e guns or effusion cells, and the most accurate quartz and GSM optical monitoring control techniques ever with 'on line re-optimization' mid process for the most demanding thin film stack designs.

Sources & Tooling Know-how 

Sources & Thickness Control

Your BAK is ready for installation of a whole range of deposition and etch sources, but also a whole range or accessories essential for precision processes.  From front and backside heating to "insitu" process monitoring technologies which adapt and tune processes "on the fly" Evatec solutions support repeatability and process yield.

BAK chamber base plate and side walls come with a series of standard feedthroughs enabling installation of the combinations of deposition, etch, and process accessories required for layer processing.

All our sources are engineered for 24/7 production, robust and easy to maintain, optimized for the lowest materials utilization and the best repeatability. You can read more about our range of sources in the BAK family brochure.

As process requirements change in the future, simply reconfigure your system by moving, exchanging or adding new ones, reconfigure your “Khan” control system in just a few minutes and you are ready to go. Control rates and terminate your layers with Evatec’s QCM quartz monitoring technology at 5 or 6MHz featuring high sampling rates, high speed switch between crystals and simultaneous control of up to 4 quartz heads from a single controller. For real time direct measurement of optical layer performance during deposition choose monochromatic or direct broadband optical monitoring techniques with direct monitoring between 380 and 1700nm for UV, VIS and IR processes.

Tooling

Evatec’s portfolio of tooling solutions is designed to maximize batch capacity for evaporation processes without compromise on film quality. Choose from single piece and segmented domes with standard geometries or flip systems for double sided processes.

For high rate metallization our range of planetary system designs enables larger batch sizes and lowest materials utilization and for complex substrate geometries our engineering department offers a bespoke design service.

Watch the BAK 911 video

Watch the Multi-BAK video

The Multi BAK - A leap forward 

1. Take a leap forward in throughput

Evatec launched its ground breaking Multi BAK concept 4 years ago. Taking our know how in automated handling and load lock technology, then combining multiple BAK process chamber in a clustered configuration around an atmospheric robot handler, the Multi BAK concept brings even greater levels of process repeatability and a jump in  in the highest volume applications.

... and now its available in two configurations, the "Multi BAK" or "BAK911", both designed to maximize throughput and process repeatability for 6 and 8 inch wafers.

Why choose Multi BAK?
  • Standard front end "Cassette" or "SMIF" load ports. Completely automated handling from front end to process chamber and back eliminates risk of operator errors, particles or wafer damage.... especially when handling thinner wafers.
  • Configure up to 4 BAK modules in one tool around the atmospheric front end module (AFEM). 
  • Fully automated load lock transfer of filled segments to process chamber which remains under vacuum delivers high quality, repeatable process conditions for highest process yields.
  • Reduce batch processing times significantly compared with classical front loaded manual systems.
  • Optimized material management including multi pocket e-guns and wire feeders maximizes number of process runs between venting of source chambers for maintenance.
  • Complete management of individual substrate journey with each wafer returned to original cassette position.
  • Tracking of every wafer to an individual location, segment or process batch for even greater level of automation.

Watch the video now - the Multi BAK.

Why choose BAK911 ?
  • Single BAK solution which still retains handling advantage of full multi BAK solution where segments are transferred to process chamber under vacuum for highest throughput and process repeatabilities
  • Ergonomic front end calotte segment loading 
  • Start with a BAK911 configuration today and upgrade to a multi BAK configuration later as your volumes grow.

Why not watch the video then contact your local Evatec sales and service office to find out more.

2. Take a leap forward in sustainability too

Through its concept, hardware and pumping design the Multi BAK is also leading the way in driving down energy consumption in its use. Talk to our specialists to learn how the MULTI BAK can reduce your energy consumption by top to 60% compared with conventional stand alone platforms.

Buying a new Evatec tool is just the first step in a long term partnership. From initial ramp up support to ongoing maintenance or retrofits adding new capabilities, maximise both uptime and tool working life together with Evatec’s local customer service teams.
CS Icons Spareparts
  • We can help you plan and manage your stocks
  • Use our exchange programmes to minimize downtimes
CS Icons Support
  • Our local Field Service Engineers on hand when you need us
  • Maximizing output - From Continuous Improvement Programmes (CIP) to new process installations
CS Icons Retrofits
  • Add new capabilities to support your technology roadmaps
  • Helping you extend tool working life
CS Icons Training
  • Helping you to help yourself
  • Tailored just for you - At Evatec or in your own fab

Read more about the BAK Family in our LAYERS magazine

LAYERS8 Promo Square Compphotonics4

Multi BAK – Pushing Boundaries in Evaporation Technology

Evatec’s Multi BAK platform combines up to four process chambers with advanced automation and LLTM technology, boosting throughput, reducing energy consumption by up to 60%, and delivering clean, repeatable processes for wireless and power applications.

LAYERS8 Promo Square Compphotonics8 (1)

Europe – A powerhouse in III-V solar cells manufacturing

Learn how Evatec evaporation solutions on the BAK and the latest substrate handling options are helping customers deliver the process repeatabilities and high production yields essential for successful manufacture of III-V solar cells.

BAK 941

BAK 941 - Taking the "great" and making it even better

Evatec’s BAK 941 cluster configuration advances evaporation technology for wireless applications by significantly increasing throughput, enabling flexible fab utilization, and supporting high‑volume manufacturing with enhanced process stability and automation.

Want to know more?

Contact your local Sales & Service team

Contact us

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