The "inline" SOLARIS® S151 offers easy tool configuration and scope for future expansion for multiple processes and substrate sizes up to 8 inch diagonal. Proven manufacturing performance combined with easy size conversion provides excellent utilization and CoO.
Choose SOLARIS® S151 for selected processes in Power Devices, Optoelectronics and Photonics.
The 6 process stations of SOLARIS® S151 can be equipped with capability for RTP, PVD, Etch or CVD. Direct substrate or carrier handling for mini batches without compromise in process quality provide flexibility for changes of process.
Tool highlights
From Augmented Reality to Photovoltaics and Power Device applications, SOLARIS® S151 offers high speed repeatability for deposition of a whole range of materials'
Choose from large area single DC, DC Reactive or RF sputter with cooling, etch and RTP capabilities up to 550C, Evatec multisource capability for up to 4 sputter cathodes at a single process station or custom sources for deposition of materials like conformal protective overlayers.
All process modules run independently in isolation and are configured according to your application.
Dielectrics: SiN-H, SiN, SiO2, Al2O3, SiC
Metal Oxides: NbO2, TiO2, Ta2O5
TCOs: ITO, GZO, Zn:AlO
Metal stacks: Al, NiV, Ag, AuGe
Alloys with MSQ multisource
Deposition uniformities <±2% over whole carrier
For more information about SOLARIS® capabilities download the brochure, take a look at some of the stories in Evatec's LAYERS magazine or contact your local sales and service organization.
The "inline" SOLARIS® S151 offers easy tool configuration and scope for future expansion for multiple processes and substrate sizes up to 8 inch diagonal. Proven manufacturing performance combined with easy size conversion provides excellent utilization and CoO.
Choose SOLARIS® S151 for selected processes in Power Devices, Optoelectronics and Photonics.
The 6 process stations of SOLARIS® S151 can be equipped with capability for RTP, PVD, Etch or CVD. Direct substrate or carrier handling for mini batches without compromise in process quality provide flexibility for changes of process.
Tool highlights
From Augmented Reality to Photovoltaics and Power Device applications, SOLARIS® S151 offers high speed repeatability for deposition of a whole range of materials'
Choose from large area single DC, DC Reactive or RF sputter with cooling, etch and RTP capabilities up to 550C, Evatec multisource capability for up to 4 sputter cathodes at a single process station or custom sources for deposition of materials like conformal protective overlayers.
All process modules run independently in isolation and are configured according to your application.
Dielectrics: SiN-H, SiN, SiO2, Al2O3, SiC
Metal Oxides: NbO2, TiO2, Ta2O5
TCOs: ITO, GZO, Zn:AlO
Metal stacks: Al, NiV, Ag, AuGe
Alloys with MSQ multisource
Deposition uniformities <±2% over whole carrier
For more information about SOLARIS® capabilities download the brochure, take a look at some of the stories in Evatec's LAYERS magazine or contact your local sales and service organization.