The LLS EVO II is a versatile batch sputtering system with a vertical, dynamic concept for up to 5 different materials and separation between load and process chamber (LC, PC). It accommodates any substrate size and shape up to 200 x 230mm. An installed base of over 300 tools worldwide has shown the tool to be reliable and robust production platform. Its flexibility, compact design and lower investment costs make it an ideal choice for smaller volume production alongside the larger single substrate processing tools in Evatec's product portfolio.
The tool can be equipped with configurable power supplies for high process flexibility. Substrate degas and etch in load chamber ensure high purity processes in the process chamber while easy conversion to various substrate sizes within 5 minutes make the LLS a flexible production tool.
LLS EVO II features
Benefit from Evatec's long process experience delivering the LLS EVO II and previous generations across all standard materials used in the semiconductor and optoelectronics industries including:
Then why not upgrade its capabilities to the latest standards?